Swedish laser specialist Micronic has developed a new technology for precise and fast pattern generation, which the company claims will revolutionise the production of photomasks for the semiconductor industry. Dupont Photomasks has placed the first order for a system.
Micronic's new laser-based pattern technology combines speed with high resolution. "A break-through in photomask manufacturing," according to the company's vice CEO Sven Löfquist.
The Micronic system, based on the company's spatial light modulator (SLM), uses laser technology to generate photomask patterns of the same resolution as a considerably slower electron beam system. SLM is based on reflection of shortwavelength laser pulses on a matrix of micro mirrors, developed at the Fraunhofer Institute in Dresden.
Each mirror can be controlled individually, which means that each reflected laser beam can generate high-resolution patterns. At the moment a 32 x 8mm matrix of one million 16 x 16um mirrors is used to create high-resolution photomasks.
Initially, the SLM technology will be used to generate structures down to 130nm. However, according to Micronic, the technology can reach dimensions of less than 100nm in a couple of year's time.
The Micronic system, based on the company's spatial light modulator (SLM), uses laser technology to generate photomask patterns of the same resolution as a considerably slower electron beam system. SLM is based on reflection of shortwavelength laser pulses on a matrix of micro mirrors, developed at the Fraunhofer Institute in Dresden.
Each mirror can be controlled individually, which means that each reflected laser beam can generate high-resolution patterns. At the moment a 32 x 8mm matrix of one million 16 x 16um mirrors is used to create high-resolution photomasks.
Initially, the SLM technology will be used to generate structures down to 130nm. However, according to Micronic, the technology can reach dimensions of less than 100nm in a couple of year's time.
Gittan Cedervall