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Swedish start-up Innolite may well become the one to bring an efficient light source to next-generation lithography. The light source being the last remaining hurdle towards a working EUV lithography process, the company's technology has set hope and interest alight amongst the world's equipment giants.
Extreme UV is winning more and more support in the industry as the technology favoured for use in next-generation lithography equipment. And Swedish Innolite, spun out of the Royal Institute of Technology, KTH, in Stockholm, is developing a light source considered as a good contender for a future industry standard.
"Our aim is to become a supplier of stepper manufacturers like ASML, Canon and Nikon. So far, there is a huge interest," says CEO Bert Junno.
Innolite was set up last autumn by researchers at KTH's physics department and Swedish venture capital firm Itact, which specialises in assisting high-tech seed-companies to bloom. In January this year, the company was off the blocks and already a week later the first interested visitors were knocking on the doors. Who and where from, Bert Junno won't tell:
"We are discussing with several equipment manufacturers. At the moment, we are working on achieving the specifications they have given us before formal collaboration can start."
The light source is based on technology developed by researchers led by professor Hans Hertz. The patented use of liquid xenon in laser plasma produces a wavelength of 13.5nm, and brings brighter light and decreases mirror erosion compared to the alternatives.
"Our aim is to become a supplier of stepper manufacturers like ASML, Canon and Nikon. So far, there is a huge interest," says CEO Bert Junno.
Innolite was set up last autumn by researchers at KTH's physics department and Swedish venture capital firm Itact, which specialises in assisting high-tech seed-companies to bloom. In January this year, the company was off the blocks and already a week later the first interested visitors were knocking on the doors. Who and where from, Bert Junno won't tell:
"We are discussing with several equipment manufacturers. At the moment, we are working on achieving the specifications they have given us before formal collaboration can start."
The light source is based on technology developed by researchers led by professor Hans Hertz. The patented use of liquid xenon in laser plasma produces a wavelength of 13.5nm, and brings brighter light and decreases mirror erosion compared to the alternatives.
Gittan Cedervall
